Projection exposure apparatus having illumination device with ring-like or spot-like light source

ABSTRACT

An illumination device, includes a secondary light source forming system having a deflecting member with a conical light deflecting surface for transforming received light into substantially ring-like light, the secondary light source forming system forming a ring-like secondary light source by using the ring-like light; and an optical system for projecting divergent lights from portions of the secondary light source obliquely onto a surface to be illuminated so that the projected lights are superposed one upon another on the surface.

This application is a continuation of prior application Ser. No.08/358,961 filed Dec. 19, 1994, which application is a continuation ofprior application Ser. No. 08/258,541 filed Jun. 10, 1994, both nowabandoned, which application is a continuation of prior application Ser.No. 08/040,991 filed Mar. 31, 1993, now U.S. Pat. No. 5,345,292 issuedSep. 6, 1994.

FIELD OF THE INVENTION AND RELATED ART

This invention relates to an illumination device and a projectionexposure apparatus using the same. More particularly, the invention isconcerned with an illumination device usable in a microdevicemanufacturing exposure apparatus (called a stepper) for illuminating apattern formed on a reticle in a manner easily attaining highresolution. In another aspect, the invention is concerned with aprojection exposure apparatus using such an illumination device.

Semiconductor device manufacturing technology has recently been advancedsignificantly and, along with this, the fine processing technique hasbeen improved considerably. Particularly, the optical processingtechnique has pressed the fine processing into a submicron region, withthe manufacture of a device of 1-megabit DRAM. A conventionally adoptedmethod for improving the resolution is mainly to enlarge the numericalaperture (NA) of an optical system while fixing an exposure wavelength.Recently, however, it has been proposed and practiced to use an exposurewavelength of i-line in place of g-line, in an attempt to improve theresolution in accordance with an exposure method using an ultra-highpressure Hg lamp.

Along with the advancement of using g-line or i-line as the exposurewavelength, the resist process itself has been advanced. Suchimprovements in the optical system and in the process together haveaccomplished rapid advancement of optical lithography.

Generally it is known that the depth of focus of a stepper is in inverseproportion to the square of the NA. It means that enhancing theresolution into a submicron order necessarily results in a problem ofdecreased depth of focus.

In consideration of this problem, many proposals have been made to useshorter wavelengths, as represented by an excimer laser, for enhancementof the resolution. It is known that the effect of using a shorterwavelength is in inverse proportion to the wavelength, and the shorterthe wavelength is, the deeper the depth of focus is.

On the other hand, independently of using light of shorter wavelength,many proposals have been made to use a phase shift mask (phase shiftmethod), in an attempt to improve the resolution. According to thismethod, a mask of conventional type is locally provided with a thin filmthat imparts to light incident on it a phase shift of 180 deg. relativeto the light incident on the remaining portion. An example has beenproposed by Levenson of the IBM corporation. Here, if the wavelength isdenoted by the parameter is denoted by k₁ and the numerical aperture isdenoted by NA, then the resolution RP can be give by:

    RP=k.sub.1 λ/NA

It is known that the parameter k₁, whose practical range is usuallytaken as 0.7-0.8, can be improved to about 0.35 with this phase shiftmethod.

There are many varieties of such a phase shift method, as referred to ina paper by Fukuda et al ("Nikkei Microdevices", July 1990, from page108).

However, there remains many problems in practically using a phase shiftmask of spatial frequency modulation type to improve the resolution.Examples are as follows:

(1) Unestablished technique for forming a phase shift film;

(2) Unestablished CAD technique optimized to a phase shift film;

(3) Existence of a pattern to which no phase shift film can be put;

(4) Necessity of using a negative type resist (in relation to problem(3); and

(5) Unestablished technique for inspection and correction.

Under these circumstances, the phase shift mask method cannot be easilypracticed in the semiconductor device manufacturing processes.

An exposure method and apparatus which attains enhanced resolutionthrough an appropriately structured illumination device, has beenproposed in Japanese patent application No. 28631/1991, filed in Japanon Feb. 22, 1991, in the name of the assignee of the subjectapplication.

In this exposure method and apparatus, such an oblique projectionillumination system is adopted wherein particular attention is paid to ahigh spatial frequency region around a k₁ factor of 0.5. Thisillumination system assures a deep depth of focus in the high spatialfrequency region.

SUMMARY OF THE INVENTION

Practical semiconductor device manufacturing processes include on onehand a process wherein high resolution of a pattern is required and, onthe other hand, a process wherein a not so high resolution of a patternis required. Thus, what is desired currently is a projection exposureapparatus which can meet the requirement of various resolutionperformances to be satisfied in various processes.

It is accordingly an object of the present invention to provide avariable or adaptable illumination device or a projection exposureapparatus using the same, by which a suitable illumination methodappropriate to the resolution actually required can be selectivelyassured without decreasing the efficiency of utilization of light.

In accordance with an aspect of the present invention, there is providedan illumination device in which a light emitting portion is disposed inthe neighborhood of a first focal point of an elliptical mirror. Myusing the light from the light emitting portion and through theelliptical mirror, an image of the light emitting portion is formed inthe neighborhood of a second focal point of the elliptical mirror. Lightfrom the image of the light emitting portion is projected through anoptical integrator having a plurality of small lenses disposedtwo-dimensionally to illuminate a surface to be illuminated. An opticaldevice is disposed demountably out of the light path, between theelliptical mirror and the integrator, to deflect the light in apredetermined direction, to thereby change the light intensitydistribution at the light entrance surface of the integrator.

In accordance with another aspect of the present invention, there isprovided an illumination device in which a light emitting portion isdisposed in the neighborhood of a first focal point of an ellipticalmirror. By using the light from the light emitting portion and throughthe elliptical mirror, an image of the light emitting portion is formedin the neighborhood of a second focal point of the elliptical mirror.This image is imaged again by an imaging system on the light entrancesurface of an optical integrator having a plurality of small lensesdisposed two-dimensionally, and a surface to be illuminated isilluminated with the light from the exit surface of the integrator. Anoptical device is disposed demountably out of the light path, adjacentto the pupil plane of the imaging system, to deflect the light in apredetermined direction, to thereby change the light intensitydistribution at the light entrance surface of the integrator.

In accordance with a further aspect of the present invention, there isprovided an illumination device in which light from a light source isprojected through an optical integrator having small lenses disposedtwo-dimensionally to illuminate the surface to be illuminated. Betweenthe light source and the integrator, an optical device for deflectinglight in a predetermined direction is demountably inserted to the lightpath, to thereby change the light intensity distribution at the entrancesurface of the integrator.

In accordance with a further aspect of the invention, there is providedan illumination device in which a light emitting portion is disposed inthe neighborhood of a first focal point of an elliptical mirror. Byusing the light from the light emitting portion and through theelliptical mirror, an image of the light emitting portion is formed inthe neighborhood of a second focal point of the elliptical mirror. Lightfrom the image of the light emitting portion is projected through anoptical integrator having a plurality of small lenses disposedtwo-dimensionally to illuminate a surface to be illuminated. An opticaldevice including at least two prism members is disposed demountably outof the light path, between the elliptical mirror and the integrator, todeflect the light in a predetermined direction, so as to allow selectionof a first state in which a light intensity distribution, rotationallysymmetric, having a higher intensity at its central portion, than at theperipheral portion is defined at the entrance surface of the integratorand a second state in which the light intensity distribution having ahigher intensity at the peripheral portion than at the central portionis defined at the entrance surface of the integrator.

In another aspect, the invention provides a method of manufacturingmicrodevices such as semiconductor memories, liquid crystal panels,magnetic heads or CCDs, for example, using an illumination device suchas above.

In a further aspect, the invention provides an exposure apparatus formanufacture of microdevices that uses an illumination device such asabove.

The deflecting member usable in the present invention may be of the typethat it refracts light at its light deflecting surface to shape ordivide the light, or that it reflects the light at its deflectingsurface to shape or divide the light.

These and other objects, features and advantages of the presentinvention will become more apparent upon a consideration of thefollowing description of the preferred embodiments of the presentinvention taken in conjunction with the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic view of a main portion of a first embodiment ofthe present invention.

FIGS. 2A, 2D and 2C are schematic views, respectively, for explaining aportion of FIG. 1.

FIGS. 3A, 3B and 3C are schematic views, respectively, for explaining aportion of FIG. 1.

FIG. 4 is a schematic view for explaining the optical function of a lenssystem 9 of FIG. 1.

FIG. 5 is a schematic view for further explaining the optical functionof the lens system 9 of FIG. 1.

FIG. 6 is a schematic view for further explaining the optical functionof the lens system 9 of FIG. 1.

FIGS. 7A and 7B are schematic views, respectively, of a modified form ofprism member usable in the present invention.

FIGS. 8A and 8B are schematic views, respectively, of a further modifiedform of a prism member usable in the present invention.

FIG. 9 is a schematic view of a portion of a second embodiment of thepresent invention.

FIGS. 10A-10C are schematic views, respectively, each for explaining aportion of a third embodiment of the present invention.

FIGS. 11A and 11B are schematic views, respectively, each for explainingthe optical function of the third embodiment.

FIGS. 12A and 12B are schematic views, respectively, each for furtherexplaining the optical function of the third embodiment.

FIGS. 13A and 13B are graphs, respectively, each showing an example of alight intensity distribution in the third embodiment of the presentinvention.

FIGS. 14A and 14B are graphs, respectively, each showing a furtherexample of a light intensity distribution in the third embodiment of thepresent invention.

FIGS. 15A-15C are schematic views, respectively, each showing a mainportion of a fourth embodiment of the present invention.

FIG. 16 is a schematic view of a main portion of a fifth embodiment ofthe present invention.

FIG. 17 is a schematic view of a main portion of a sixth embodiment ofthe present invention.

FIGS. 18A and 18B are schematic views for explaining a portion of FIG.17.

FIGS. 19A and 19B are schematic views for further explaining a portionof FIG. 17.

FIGS. 20A-20C are schematic views, respectively, each for explaining thestate of incidence of light upon a light entrance plane 10a of anoptical integrator 10 of FIG. 17.

FIG. 21 is a schematic view of an apertured stop.

FIG. 22 is a schematic view of a main portion of a seventh embodiment ofthe present invention.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

FIG. 1 is a schematic view of an illumination device and a projectionexposure apparatus using the same, according to an embodiment of thepresent invention. In this embodiment, the invention is applied to areduction projection type exposure apparatus, called a stepper. Thisexposure apparatus can be used for manufacture of microdevices such assemiconductor memories, CCDs, liquid crystal panels or a magnetic head,for example.

Denoted in the drawing at 1 is a light source such as a high luminanceultra high pressure Hg lamp, for example, for emitting ultraviolet lightor deep UV light. The light source 1 has its light emitting portion 1adisposed adjacent to the first focal point of an elliptical mirror 2.

The light emanating from the light source 1 is reflected and collectedby the elliptical mirror 2, and then it is reflected by a cold mirror 3by which an image 1b of the light emitting portion 1a (an image of thelight source) is formed in the neighborhood of the second focal point 4of the elliptical mirror 2. The cold mirror 3 has a multilayered filmand it mainly serves to transmit infrared light but to reflectultraviolet light.

Denoted at 101 is an imaging system having two lens systems 5 and 9. Itserves to image the light source image 1b, formed in the neighborhood ofthe second focal point 4, upon an entrance plane 10a of an opticalintegrator 10 through the cooperation of an optical device 8. Theoptical device 8 comprises a prism member 6 having a conical prism, fordeflecting received light to a predetermined direction, and a parallelflat plate 7 for projecting received light directly.

Denoted at 8a is a holding member by which the prism member 6 and theparallel plate 7 of the optical device 8 can be alternately andselectively placed on the light path. When the parallel plate 7 is onthe path, the imaging system 101 is defined as a telecentric system onthe exit side. The optical device 8 is disposed in the neighborhood ofthe pupil plane of the imaging system, where the opening of theelliptical mirror is imaged.

The optical integrator 10 comprises a plurality of small lenses whichare arrayed two-dimensionally, and it serves to define a secondary lightsource 10c in the neighborhood of the exit surface 10b thereof. Denotedat 11 is a stop member having a plurality of apertures. The stop memberis provided with a mechanism by which the shape of an aperture on thelight path can be changed. To the secondary light source 10c, the stopmember 11 is disposed in such a region in which discrete secondary lightsource elements do not overlap.

Denoted at 14a is a lens system for collecting the light from the exitsurface 10b of the optical integrator 10 and for illuminating, throughthe stop member 11 and a mirror 13 as well as a collimator lens 14b, areticle (surface to be illuminated) 15 placed on a reticle stage 16. Thelens system 14a and the collimator lens 14b constitute a condensing lenssystem 14.

Denoted at 17 is a projection optical system for projecting, in areduced scale, a pattern formed on the reticle 15 upon the surface of awafer 18 which is placed on a wafer chuck 19. Denoted at 20 is a waferstage on which the wafer chuck 19 is mounted. In this embodiment, withthe condensing lens system 14, an image of the secondary light source10c formed in the neighborhood of the exit surface 10b of the opticalintegrator 10, is formed in the neighborhood of a pupil 17a of theprojection optical system 17.

Next, description will be made of the manner of changing the lightintensity distribution of the image of the secondary light source, whichimage is formed at the pupil plane 17a of the projection optical system17, in accordance with the present embodiment by changing the lightintensity distribution at the light entrance surface 10a of the opticalintegrator 10 through the optical device 8.

FIGS. 2A and 3A each illustrate the light path from the ellipticalmirror 2 (FIG. 1) to the optical integrator 10, the path being extended.The mirror 3 is not shown in FIG. 2A or 3A. The illustrations of FIGS.2A-2C and 3A-3C explain that the light intensity distribution upon theentrance surface 10a of the optical integrator 10 is changed byalternately selecting the elements 6 and 7 of the optical device 8.

FIGS. 2A-2C correspond to a case where the parallel plate 7 of theoptical device 8 is disposed on the light path, whereas FIGS. 3A-3Ccorrespond to a case where the prism member 6 of the optical device 8 isdisposed on the light path.

The illumination system of FIG. 2A is adapted for a first state ofprojection in which a very high resolution is not required but in whicha larger depth of focus is assured. The illumination system of FIG. 3Ais adapted for a second state of projection in which a high resolutionis required mainly.

FIGS. 2C and 3C each is a schematic representation of a light intensitydistribution upon the light entrance surface 10a of the opticalintegrator 10. The zone depicted by hatching in the drawings denotes theregion of higher light intensity, as compared with the remaining region.FIGS. 2B and 3B illustrate a distribution of light intensity I along theX-axis direction (FIGS. 2C or 3C).

In FIG. 2A, the parallel plate 7 of the optical device 8 is disposed onthe light path, and the light source image 1b as formed at the secondfocal point 4 of the elliptical mirror 2 is imaged by the imaging system101 upon the light entrance surface 10a of the optical integrator 10.Here, as seen in FIG. 2B, the light intensity distribution in sectionupon the light entrance surface 10a of the optical integrator 10 has anapproximately Gaussian shape which is rotationally symmetric.

In FIG. 3A, the prism member 6 of the optical device 8 is placed on thelight path, and the light source image (point image) 1b formed at thesecond focal point 4 of the elliptical mirror 2 is imaged, into aring-like shape, on the light entrance surface 10a of the opticalintegrator 10 by the imaging system 101. The light intensitydistribution on the light entrance surface 10a of the integrator 10 hasa ring-like shape such as shown in FIGS. 3B or 3C wherein the lightintensity is lower at the optical axis portion but is higher at theperipheral portion. Why this is so will now be explained below.

FIG. 4 schematically illustrates the disposition of the parallel flatplate 7, the lens system 9 and the light entrance surface 10a of theoptical integrator 10 of FIG. 2A. In this embodiment, these elements areso disposed that the optical distance between the parallel plate 7 andthe forward principal point of the lens system 9 as well as the opticaldistance between the backward principal point of the lens system 9 andthe light entrance surface 10a of the integrator 10 are, if the focallength of the lens system g is denoted by f₀, both equal to a distancef₀.

Here, the incidence height t₁, from the optical axis, of the lightemanating from the parallel plate 7 with an angle α₀ and impinging onthe light entrance surface 10a is expressed as follows:

    t.sub.1 =f.sub.0 ·tanα.sub.0

If the height, from the optical axis, of the outermost light passingthrough the parallel plate 7 is denoted by S₀, then the angle β ofincidence upon the light entrance surface 10a of the integrator is givenby:

    β=tan.sup.-1 (S.sub.0 /f.sub.0)

It is seen therefrom that, by deflecting the angle of light at theposition of the parallel plate 7 (i.e., the forward focal plane of thelens system 9), it is possible to change only the position of incidencelight upon the entrance surface 10a of the optical integrator withoutchanging the angle of incidence.

Based on the optical principle described, in the present embodiment, byinterchanging the parallel plate 7 by the prism member 6 comprising aconical prism, the light intensity distribution on the entrance surface10a of the integrator 10 is changed into a ring-like intensitydistribution having a lower intensity at the optical axis portion and ahigher intensity at the peripheral portion.

Since the light intensity distribution on the entrance surface 10a ofthe integrator 10 corresponds to the light intensity distribution of aneffective light source which is defined at the pupil plane 17a of theprojection optical system 17, by using the prism member 6 in place ofthe parallel plate 7 such an effective light source having a lightintensity at distribution having a lower intensity at a central portion(optical axis portion) and a higher intensity at a peripheral portion isdefined on the pupil plane of the projection optical system.

In this embodiment, the stop member 11 is provided in the neighborhoodof the exit surface 10b of the optical integrator 10. This stop memberhas a plurality of apertures and is provided with a mechanism forchanging, as desired, the aperture shape thereof. The aperture shapewhich is variable is predetermined and it corresponds to the shape ofthe secondary light source to be formed at the pupil plane 17a of theprojection optical system 17. For example, the stop member may have aring-like aperture of a property for passing a larger quantity of lightat its peripheral portion than at its central portion.

In this embodiment, the selection of the prism member 6 of the opticaldevice 8 singley or the selection of the prism member 6 together withthe changing of the aperture shape of the stop member 11 in combination,assures a desired shape of effective light source while attaining a highefficiency of light utilization.

It is to be noted that the provision of the stop member 11 is not arequisition in this embodiment.

With the arrangement of this embodiment as described above, for areticle 15 pattern having a relatively large minimum linewidth, thestructure shown in FIG. 2A is selected (like an illumination system ofconventional type), whereby a Gaussian shaped light intensitydistribution is provided at the entrance surface 10a of the opticalintegrator 10 (first state).

On the other hand, for a pattern having a relatively small minimumlinewidth, the structure shown in FIG. 3A is selected to provide aring-like light intensity distribution at the entrance surface 10a ofthe integrator 10. Also, the aperture shape of the stop member 11 ischanged. By this, an illumination device for high resolution projectionis assured (second state).

The insertion of the parallel plate 7 in the first state of FIG. 2A isto minimize the difference in optical path length between the lenssystems 5 and 9, as compared with that in the case where the prismmember 6 is inserted in the second state. If the prism member 6 has asmall thickness or if a slight change in optical path length between thelens systems 5 and 9 does not influence the optical performance of theoptical integrator 10 or of any other optical elements following it, theparallel plate 7 may be omitted.

FIGS. 5 and 6 are schematic representations for explaining therelationship of the incidence height (heights t₁ end t₂ from the opticalaxis) at the entrance surface 10a of the optical integrator 10, relativeto the position (exit heights S₁ and S₂) and deflection angle (α₁ andα₂) of light passing through the parallel plate 7, where in the presentembodiment the focal length f of the lens system 9 constituting theimaging system 101 is changed.

If in FIG. 5 the focal length of the lens system 9 is f₁, then t₁ =f₁tan α₁ applies. Also, in FIG. 6, if the focal length of the lens system9 is f₂, then t₂ =f₂ tan α₂ applies.

It is seen from these equations that if the focal length of the lenssystem 9 is made large then it is possible to obtain, at the entrancesurface 10a of the optical integrator 10, an incidence position t₁ ofdesired height with a small deflection angle α at the position of theparallel plate 7. This means that if the focal length f of the lenssystem 9 is made large then it is possible to make small the angle ofthe prism member 6 (prism angle) in the second state. This assures animaging system 101 of smaller aberration. Practically, in considerationof the size of the prism member 6, the focal length of the lens system 9may be so set to define a prism angle of 5-20 deg.

The prism member 6 of the optical device of the present invention is notlimited to a conical prism. It may have any shape provided that it has afunction for deflecting received light in a predetermined direction. Forexample, pyramidal prisms such as shown in FIGS. 8A and 8B may be used.

FIGS. 7B and 8B schematically illustrate a light intensity distributionon the entrance surface 10a of the integrator 10 when the prism membersuch as shown in FIG. 7A or 8A is used. The zones depicted by hatchingdenote regions of higher intensity as compared with the remainingregion.

It is possible in the present invention to use three or more types ofinterchangeable optical members such as prisms and a parallel plate,rather than only two optical members of the prism 6 and the parallelplate 7 are interchanged as in the present embodiment.

Further, the pyramidal prism such as shown in FIG. 7A may be rotatedabout the optical axis, for smoothing with respect to time, to provide aring-like light intensity distribution such as shown in FIG. 3C.

Still further, the light source 1 may be displaced along the opticalaxis concurrently with the interchange of the prism member, to changethe size of the higher light intensity region.

FIG. 9 is a schematic view of a main portion of a second embodiment ofthe present invention.

In this embodiment, as compared with the first embodiment of FIG. 1, ahalf mirror 30 is disposed on the light path at the position before(light source 1 side of) the optical integrator 10, so that a portion ofthe light from the imaging system 101 is directed to a photodetector 31which may comprise a CCD or a quadrant sensor. The remaining portion isof the same structure as that of the first embodiment.

In this embodiment, the light intensity distribution at the lightentrance surface 10a of the optical integrator 10 is measured indirectlyto monitor the same. This allows adjustment of the imaging system 101while monitoring changes in light intensity and/or light intensitydistribution at the entrance surface 10a.

In this embodiment, a mechanism 60 for rotating the optical member 6about the optical axis or for shifting the same with respect to theoptical axis, may be used. This provides the ability to change the lightintensity distribution at the entrance surface 10a of the integrator 10into a desired shape easily.

FIGS. 10A is a schematic view of a main portion of a third embodiment ofthe present invention.

In this embodiment, as compared with the first embodiment of FIG. 1, inaddition to the insertion of the prism member 6 into the light path, thelens system 9 is replaced by a lens system 33 of a different focallength which is disposed at the entrance face 10a side of the opticalintegrator 10. The remaining portion is of the same structure as that ofthe first embodiment.

In this embodiment, light is collected to a region narrower than theentrance surface 10a of the integrator 10, and light intensitydistribution of a desired shape is obtained.

Referring now to FIGS. 11A, 11B, 12A and 12B, the optical function ofthis embodiment will be explained.

FIGS. 11A-12B schematically illustrate the light path from the opticaldevice 8 (prism 6 and parallel plate 7) to the integrator 10. FIGS. 13A,13B, 14A and 14B show a light intensity distribution at the entrancesurface 10a of the integrator 10, defined by using the prism member 6 orthe parallel plate 7.

FIG. 11A shows the arrangement where, in the first embodiment, aconventional type of illumination is to be done. Generally, the angle oflight rays that can enter the optical integrator is determined and, inthe example of FIG. 11A, the angle is θ₁. Thus, the optical systembefore the integrator 10 is designed so that the angle of incidence uponthe integrator 10 becomes not greater than the angle θ. Here, in thelight intensity distribution at the entrance surface 10a of theintegrator 10, the degree of convergence is limited due to Lagrange'sinvariant. For example, it is not possible to improve the degree ofconvergence beyond that of FIG. 13A. An attempt to obtain a higherdegree of convergence simply ends in that the angle of incidence uponthe integrator 10 goes beyond the angle θ.

FIG. 11B shows the state where, in the first embodiment, the prismmember 6 is inserted into the light path. FIG. 13B shows a correspondinglight intensity distribution at the entrance surface 10a. Here, themaximum incidence angle of the light upon the entrance surface 10a, atthe point S₁, is θ₁ the same in the FIG. 11A example. However, theeffective light that angle of the light actually enters is θ₂.

As seen from FIG. 12A, with the provision of an optical device 32 (whichmay comprise a prism or a field lens) in front of the entrance surface10a, it is possible to reduce the maximum incidence angle. FIG. 14Ashows a corresponding light intensity distribution at the entrancesurface 10a.

Here, since the maximum incidence angle is loosened, by shortening thefocal length of the optical system from the prism 6 to the opticalintegrator it is possible to obtain a higher degree of convergence. FIG.12B shows an example wherein the degree of convergence is improved onthe basis of such an optical principle just described. A correspondinglight intensity distribution is shown in FIG. 13B. In the example ofFIG. 12B, the prism member 6 has an enlarged prism angle so as to obtaina light intensity distribution of a ring-like shape.

In this embodiment, the insertion of the prism member 6 as describedcauses shift of the angle of incidence at the entrance surface 10a ofthe integrator 10 with the maximum incidence angle being unchanged. Bycorrecting such shift and optimizing the incidence angle, the incidenceangle is loosened. Thus, it becomes possible to increase the degree ofconvergence to the limit where the incidence angle becomes equal to thecritical incidence angle.

Practical means for this end may be using a zoom system for the opticalsystem from the prism member 6 to the integrator 10; usinginterchangeable optical systems; provision of a prism (conical prismwhere the prism member 6 comprises a conical prism; a pyramidal prismwhere the prism member 6 comprises a pyramidal prism) in front of theintegrator 10; insertion of an aspherical lens; or an appropriatecombination of them.

FIGS. 15A-15C are schematic views of a portion of a fourth embodiment ofthe present invention.

In this embodiment, as compared with the first embodiment of FIG. 1, theposition of the optical device 8 (the position of prism member 6 and/orparallel plate 7) is shifted from the pupil of the imaging system 101and the focal length of the optical system 9 is changed, to therebyconverge the light intensity distribution at the entrance surface 10a ofthe optical integrator 10. The remaining portion is of the samestructure as that of the first embodiment.

In FIGS. 15A-15C, reference character P denotes the pupil plane of thelens system 9. FIG. 15A shows the first state of illumination in thefirst embodiment. The angle of incidence upon the integrator 10 is θ.FIG. 15B shows the second state of illumination in the first embodiment,and the incidence angle is θ the same as in the FIG. 11A example. Here,if the prism member 6 is shifted from the pupil plane P and the beamdiameter on the plane P is reduced such as shown in FIG. 15C, then it ispossible to make the incidence angle θ' smaller than the angle θ₂ of theFIGS. 11A and 11B examples. In the present embodiment, on this occasion,the focal length of the lens system 9 is changed so as to assure thatthe light intensity distribution at the entrance surface 10a of theintegrator 10 is collected and converged locally.

FIG. 16 is a schematic view of a main portion of a fifth embodiment ofthe present invention.

In this embodiment, as compared with the first embodiment of FIG. 1, thelens system 5 constituting the imaging system 101 is omitted and theopening 2a of the elliptical mirror 2 is imaged by the lens system 9upon the entrance surface 10a of the optical integrator 10. Also, theoptical device 8 is disposed in the neighborhood of the second focalpoint of the elliptical mirror 2. The remaining portion is of the samestructure as that of the first embodiment.

More specifically, in the embodiment of FIG. 1, an image of the lightemitting portion 1a of the light source 1 is formed on the entrancesurface 10a of the integrator 10, and the optical device 8 is disposedin the neighborhood of the imaging position of the opening 2a of theelliptical mirror 2 (the position of the image of the opening 2a) whichis between the light source 1 and the integrator 10.

In the present embodiment, as compared, the image of the opening 2a ofthe elliptical mirror 2 is formed on the entrance surface 10a of theintegrator 10, and the optical device 8 is disposed at the imagingposition of the light emitting portion 1a (the second focal pointposition of the elliptical mirror 2) which is between the light source 1and the optical integrator 10.

Thus, in this embodiment, the forward focal point position of the lenssystem 9 is placed substantially at the second focal point position ofthe elliptical mirror 2, and by the lens system 9, the light from thelight source image 1b at the second focal point is transformed intosubstantially parallel light which is then directed to the entrancesurface 10a of the integrator 10. When the prism member 6 is beinginserted and if it is of the type such as shown in FIG. 7A, fourparallel lights from the lens system 9 are projected on the entrancesurface 10a of the integrator 10.

FIG. 17 is a schematic view of a main portion of a sixth embodiment ofthe present invention.

In this embodiment, as compared with the first embodiment of FIG. 1, theoptical device 8 comprises at least two prism members 6a and 6b disposedalong the optical axis and, for changing the light intensitydistribution at the entrance surface 10a of the integrator 10, namely,for rendering the illumination system into the second state, the opticaldevice 8 (prism members 6a and 6b) is mounted on the optical axis and,additionally, a portion of the lens system 9a constituting the imagingsystem 101 is replaced by another lens system 9b so as to reduce theincidence angle of an off-axis principal ray to the entrance surface10a. This is done for efficient utilization of light.

In the illumination method of this embodiment, in the first state thelens system 9a is placed on the light path (the optical device 8 is notused), so at to provide a light intensity distribution at the entrancesurface 10a of the integrator 10, that is, a light intensitydistribution at the pupil plane 17a of the projection optical system 17,which distribution is of a rotationally symmetric shape wherein theintensity is higher at the central portion than at the peripheralportion.

The second state is defined by placing the optical device 8 (prismmembers 6a and 6b) on the light path and by replacing the lens system 9aby the lens system 9b having a different focal length. This makessmaller the angle of incidence of the principal ray upon the entrancesurface 10a of the integrator 10, whereby at this entrance surface 10a,namely, at the pupil plane 17a of the projection optical system 17, sucha light intensity distribution in which the intensity is higher in theperipheral portion than in the central portion is provided.

Structural features of this embodiment over the first embodiment will beexplained in more detail.

In FIG. 17, lens system 5 collects the light from the light source image1b formed in the neighborhood of the second focal point 4, and it emitsparallel light. The imaging system 101 (lens systems 5 and 9a) istelecentric on the exit side. At least a portion of the collecting lens14 is made movable along the optical axis, to adjust the light intensitydistribution on the reticle 15.

In this embodiment, in accordance with the orientation and/or thelinewidth to be resolved of the pattern of the reticle 15, for example,the lens system 9a which is a constituent element of the imaging system101 is replaced by the optical device 8 (including two prisms 6a and 6b)and the lens system 9b, to change the light intensity distribution atthe entrance surface 10a of the integrator 10. Additionally, ifnecessary, the aperture shape of the stop member 11 is changed to changethe light intensity distribution of the image of the secondary lightsource which image is formed at the pupil plane 17a of the projectionoptical system 17.

Next, the manner of changing in this embodiment the light intensitydistribution on the entrance surface 10a of the integrator 10 as well asthe light intensity distribution of the image of the secondary lightsource to be formed on the pupil plane 17a of the projection opticalsystem 17, on the basis of the optical device 8, will be explained.

FIGS. 18 through 19B each schematically illustrate the light path fromthe elliptical mirror 2 to the optical integrator 10 of FIG. 17, thepath being extended. The mirror 3 is not shown in FIG. these figures.The illustrations of FIGS. 18A and 19A explain that the components ofthe optical device 8 are interchanged to change the light intensitydistribution on the entrance surface 10a of the integrator 10.

FIG. 18A shows the state in which the lens system 9a is placed on thelight path. FIG. 19A shows the state in which the lens system 9a isremoved and, in place thereof, the prism members 6a and 6b of theoptical device 8 and the lens system 9b are placed on the light path.

The illumination system of FIG. 18A is in the first state of projectionin which a very high resolution is not required but a large depth offocus is assured, as in the illumination method of a conventional type.The illumination system of FIG. 19A is in the second state ofprojection, according to the present invention, mainly for attaininghigh resolution.

FIG. 18B and FIG. 19B each schematically shows a corresponding lightintensity distribution on the entrance surface 10a of the integrator 10.The zone depicted by hatching denotes the region of higher intensity ascompared with the remaining region. In these illustrations, thedistribution of light intensity I along the X-axis direction aredepicted.

FIGS. 20A, 20B and 20C are schematic representations, for explaining thelight rays impinging on the optical integrator 10, in the systems ofFIGS. 18A and 19A. Reference characters +θ and -θ each denotes the range(angle) of light rays that can enter the optical integrator 10 (that canemerge from the integrator without being eclipsed). A grid portion ineach illustration depicts the zone in which the light intensity ishigher than that of the light entering the integrator 10.

FIG. 18A shows the optical arrangement in ordinary illumination. Here,the light intensity distribution at the entrance face 10a of theintegrator 10 is like a Gaussian distribution such as shown in FIG.18(B). The incidence angle thereof is such as shown in FIG. 20A. When inthis state the illumination for high resolution is to be done, there maybe a method in which a stop 121 having an aperture 121a such as shown inFIG. 21 is inserted at the back of or in front of the integrator 10.However, with this method, only the light in the hatched zone of thelight intensity distribution of FIG. 18A, can be used and, therefore,the illuminance decreases considerably.

In this embodiment, in consideration thereof, as shown in FIG. 19A, thelens system 9a is replaced by the lens system 9b of smaller focal length(the optical components are disposed so that, if the focal length of thelens system 9b is f_(9b), the optical distance between the prism 6a andthe lens system 9b and the optical distance between the lens system 9band the entrance surface 10a of the integrator 10 are both equal tof_(9b)), such that the light intensity distribution as shown in FIG.19B, is provided at the entrance surface 10a of the integrator 10.

Additionally, the prism member 6b having an appropriate prism angle isinserted in front of the integrator 10, by which the incidence angle oflight rays (incidence angle of off-axis light) is made smaller such asshown in FIG. 20C. This assures efficient impingement or entrance oflight into the integrator 10. Thus, almost all the input light can beused for the illumination.

On the basis of the optical principle described above, the presentembodiment uses the optical arrangement such as shown in FIG. 19A, bywhich illumination for high resolution is assured without a substantialloss of illuminance at the surface to be illuminated.

The prism member 6a or 6b of pyramidal shape provided within the imagingsystem 101 may have a shape such as shown in FIG. 8, for example. Ofcourse, it may be a conical prism.

While the embodiment has been explained with reference to an examplewherein the lens system 9a of FIG. 18A for ordinary illumination isreplaced by the lens system 9b of FIG. 19A for high resolutionillumination, the lens elements of the lens system 9a may be displaced(like a zoom lens system) to define the same condition as by the lenssystem 9b. Only some of the lens elements may be moved like a zoom lenssystem or, alternatively, some lens elements may be replaced bydifferent lens elements.

The stop member 121 for high resolution such as shown in FIG. 21 may beused as desired, or it may be omitted. Further, while in this embodimentthe focal length of the lens system 9a is changed to change themagnification of the imaging system 101, the focal length of the lenssystem 5 may be changed. Alternatively, both of the focal lengths of thelens systems 5 and 9 may be changed.

In this embodiment, there are cases wherein, in response to theinterchange of the ordinary illumination (first state) and theillumination for high resolution (second state), uniformness inilluminance (non-uniformness of illuminance) upon the surface beingilluminated changes into axial symmetry. On that occasion, a portion ofthe optical system 14 may be displaced along the optical axis to changeaberration such as distortion to thereby correct for the axiallysymmetric non-uniformness of illuminance upon the surface (reticle 15surface) to be illuminated.

While in the preceding embodiment the reticle 15 (surface to beilluminated) is disposed just after the optical system 14, an additionalimaging system may be disposed between the optical system 14 and thereticle such that a plane which is optically conjugate with the reticle15 surface with respect to the additional imaging system may beilluminated.

FIG. 22 is a schematic view of a main portion of a seventh embodiment ofthe present invention.

In this embodiment, as compared with the first embodiment of FIG. 1, ahalf mirror 43 is disposed between the integrator 10 and the surface 15to be illuminated, so as to allow detection of the amount of exposure ofthe surface being illuminated. The remaining portion is of substantiallythe same structure as that of the first embodiment.

In FIG. 22, denoted at 44 is the reticle pattern surface or a planewhich is optically conjugate with the reticle pattern surface. Denotedat 45 is a pinhole member which is disposed at a position opticallyconjugate with the plane 44. Denoted at 33 is a photosensor (e.g., a CCDor quadrant sensor).

With this arrangement of the present embodiment, it is possible tomonitor the effective light source distribution at the center of thesurface being illuminated. Also, in this embodiment it is possible toconcurrently monitor, with the photodetector 31, the amount of exposureof the surface being illuminated.

While in this embodiment the half mirror 43 is placed between the lenssystem 13a and the collimator lens 14b, it may be disposed at anyposition between the integrator 10 and the surface 15.

In accordance with the present invention, in consideration of finenessand/or orientation of a pattern of a reticle to be projected andtransferred, an illumination system suited to such pattern can beselected.

While the invention has been described with reference to the structuresdisclosed herein, it is not confined to the details set forth and thisapplication is intended to cover such modifications or changes as maycome within the purposes of the improvements or the scope of thefollowing claims.

What is claimed is:
 1. A projection exposure apparatus, comprising:alight source for producing light; a concave mirror for reflecting lightfrom said light source, said concave mirror having an opening from whichthe reflected light is emitted; an imaging optical system for receivingthe reflected light from said concave mirror and for forming an image ofthe opening of said concave mirror with the reflected light; an opticalintegrator for receiving the image of the opening and for forming asecondary light source; an illumination optical system for illuminatinga pattern of an original with light beams from the secondary lightsource; and a projection optical system for projecting an image of thepattern of the original, as illuminated, onto a substrate to be exposed,wherein said imaging optical system comprises a light deflecting memberhaving a conical light deflecting surface and being provided in avicinity of a position optically conjugate with said light source, saidlight deflecting member being arranged to deflect the reflected lightfrom said concave mirror to emit ring-like light in a directiondifferent from the direction in which the reflected light is projectedon said light deflecting member, thereby to produce, as the secondarylight source, a light source of a substantially ring-like shape.
 2. Anapparatus according to claim 1, wherein said light deflecting membercomprises a prism.
 3. An apparatus according to claim 1, wherein saidlight deflecting member is removably inserted on a path of the reflectedlight.
 4. An apparatus according to claim 1, further comprising anaperture member having a ring-like opening, said aperture member beingdisposed adjacent to the secondary light source.
 5. An apparatusaccording to claim 1, wherein said concave mirror forms an image of saidlight source at a focal point thereof, with the reflected light, andsaid light deflecting member is disposed adjacent to the focal point ofsaid concave mirror.
 6. A projection exposure apparatus, comprising:alight source for producing light; a concave mirror for reflecting lightfrom said light source, said concave mirror having an opening from whichthe reflected light is emitted; an imaging optical system for receivingthe reflected light from said concave mirror and for forming an image ofthe opening of said concave mirror with the reflected light; an opticalintegrator for receiving the image of the opening and for forming asecondary light source; an illumination optical system for illuminatinga pattern of an original with light beams from the secondary lightsource; and a projection optical system for projecting an image of thepattern of the original, as illuminated, onto a substrate to be exposed,wherein said imaging optical system comprises a light deflecting memberhaving a pyramidical light deflecting surface and being provided in avicinity of a position optically conjugate with said light source, saidlight deflecting member being arranged to deflect the reflected lightfrom said concave mirror to emit a number of light beams in a directiondifferent from the direction in which the reflected light is projectedon said light deflecting member, thereby to produce, as the secondarylight source, a number of substantially spot-like light sources.
 7. Anapparatus according to claim 6, wherein said light deflecting membercomprises a prism.
 8. An apparatus according to claim 6, wherein saidlight deflecting member is removably inserted on a path of the reflectedlight.
 9. An apparatus according to claim 6, further comprising anaperture member having a ring-like opening, said aperture member beingdisposed adjacent to the secondary light source.
 10. An apparatusaccording to claim 6, wherein said concave mirror forms an image of saidlight source at a focal point thereof, with the reflected light, andsaid light deflecting member is disposed adjacent to the focal point ofsaid concave mirror.
 11. A projection exposure apparatus comprising:alight source for producing light; a concave mirror for reflecting thelight from said light source, said concave mirror having an opening fromwhich the reflected light is emitted; an imaging optical system forreceiving the reflected light from said concave mirror and for formingan image of the opening of said concave mirror with the reflected light,said imaging optical system comprising (i) a light deflecting memberhaving a conical light deflecting surface and (ii) a parallel flatplate, one of which is selectively supplied to a path of the reflectedlight; an optical integrator for receiving the image of the opening andfor forming a secondary light source; an illumination optical system forilluminating a pattern of an original with light beams from thesecondary light source; and a projection optical system for projectingan image of the pattern of the original, as illuminated, onto asubstrate to be exposed, wherein said light deflecting member isprovided in a vicinity of a position optically conjugate with said lightsource and is arranged to deflect the reflected light from said concavemirror to emit ring-like light in a direction different from a directionin which the reflected light is projected on said light deflectingmember thereby to produce, as the secondary light source, a light sourceof substantially ring-like shape, and wherein said parallel flat plateis transparent and is adapted to emit light in a direction the same asthe direction in which the reflected light is projected thereon.
 12. Anapparatus according to claim 11, wherein said light deflecting membercomprises a prism.
 13. An apparatus according to claim 11, furthercomprising an aperture member having a ring-like opening, said aperturemember being disposed adjacent to the secondary light source.
 14. Anapparatus according to claim 11, wherein said concave mirror forms animage of said light source at a focal point thereof, with the reflectedlight, and the one of said light deflecting member and said parallelflat plate is disposed adjacent to the focal point of said concavemirror.
 15. A projection exposure apparatus comprising:a light sourcefor producing light; a concave mirror for reflecting the light from saidlight source, said concave mirror having an opening from which thereflected light is emitted; an imaging optical system for receiving thereflected light from said concave mirror and for forming an image of theopening of said concave mirror with the reflected light, said imagingoptical system comprising (i) a light deflecting member having apyramidical light deflecting surface and (ii) a parallel flat plate, oneof which is selectively supplied to a path of the reflected light; anoptical integrator for receiving the image of the opening and forforming a secondary light source; an illumination optical system forilluminating a pattern of an original with light beams from thesecondary light source; and a projection optical system for projectingan image of the pattern of the original, as illuminated, onto asubstrate to be exposed, wherein said light deflecting member isprovided in a vicinity of a position optically conjugate with said lightsource and is arranged to deflect the reflected light from said concavemirror to emit a number of light beams in a direction different from adirection in which the reflected light is projected on said lightdeflecting member, thereby to produce, as the secondary light source, anumber of substantially spot-like light sources, and wherein saidparallel flat plate is transparent and is adapted to emit light in adirection of the same as a direction in which the reflected light isprojected thereon.
 16. An apparatus according to claim 15, wherein saidlight deflecting member comprises a prism.
 17. An apparatus according toclaim 15, further comprising an aperture member having a ring-likeopening, said aperture member being disposed adjacent to the secondarylight source.
 18. An apparatus according to claim 15, wherein saidconcave mirror forms an image of said light source at a focal pointthereof, with the reflected light, and wherein the one of said lightdeflecting member and said parallel flat plate is disposed adjacent tothe focal point of said concave mirror.
 19. A projection exposureapparatus comprising:a light source for producing light; an imagingoptical system for receiving the light from said light source and forforming an image of said light source with the received light, saidimaging optical system comprising (i) a light deflecting member having aconical light deflecting surface and (ii) a parallel flat plate, one ofwhich is selectively supplied to a path of the light from said lightsource; an optical integrator for receiving the image of said lightsource and for forming a secondary light source; an illumination opticalsystem for illuminating a pattern of an original with light beams fromthe secondary light source; and a projection optical system forprojecting an image of the pattern of the original, as illuminated, ontoa substrate to be exposed, wherein said light deflecting member isarranged to deflect reflected light from said light source to emitring-like light in a direction different from a direction in which thelight from said light source is projected on said light deflectingmember thereby to produce, as the secondary light source, a light sourceof a substantially ring-like shape, and wherein said parallel flat plateis transparent and is adapted to emit light in a direction the same as adirection in which the light from said light source as projectedthereon.
 20. An apparatus according to claim 19, wherein said lightdeflecting member comprises a prism.
 21. An apparatus according to claim19, further comprising an aperture member having a ring-like opening,said aperture member being disposed adjacent to the secondary lightsource.
 22. A projection exposure apparatus comprising:a light sourcefor producing light; an imaging optical system for receiving the lightfrom said light source and for forming an image of said light sourcewith the received light, said imaging optical system comprising (i) alight deflecting member having a pyramidical light deflecting surfaceand (ii) a parallel flat plate, one of which is selectively supplied toa path of the light from said light source; an optical integrator forreceiving the image of said light source and for forming a secondarylight source; an illumination optical system for illuminating a patternof an original with light beams from the secondary light source; and aprojection optical system for projecting an image of the pattern of theoriginal, as illuminated, onto a substrate to be exposed, wherein saidlight deflecting member is arranged to deflect reflected light from saidlight source to emit a number of light beams in a direction differentfrom a direction in which the light from said light source is projectedon said light deflecting member, thereby to produce, as the secondarylight source, a number of substantially spot-like light sources, andwherein said parallel flat plate is transparent and is adapted to emitlight in a direction the same as a direction in which the light fromsaid light source is projected thereon.
 23. An apparatus according toclaim 22, wherein said light deflecting member comprises a prism.
 24. Anapparatus according to claim 22, further comprising an aperture memberhaving a ring-like opening, said aperture member being disposed adjacentto the secondary light source.